- 专利标题: Method and system for inspecting processing apparatus
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申请号: US17010885申请日: 2020-09-03
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公开(公告)号: US11817335B2公开(公告)日: 2023-11-14
- 发明人: Kippei Sugita , Kenji Nagai
- 申请人: Tokyo Electron Limited
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Pearne & Gordon LLP
- 优先权: JP 19163018 2019.09.06
- 主分类号: G01N21/25
- IPC分类号: G01N21/25 ; G01N21/45 ; H01L21/67 ; G01N21/95 ; G01B5/00 ; G01K11/125
摘要:
A system configured to inspect a processing apparatus includes a temperature adjusting device configured to adjust a temperature of a component within a processing chamber of the processing apparatus; a light source configured to emit measurement light; multiple optical elements configured to output the measurement light emitted from the light source to the component within the processing chamber of the processing apparatus as output light and configured to receive reflected light from the component during a temperature adjustment of the component by the temperature adjusting device; and a controller configured to measure temperatures of the component at measurement points respectively corresponding to the multiple optical elements based on the reflected light, and make a determination upon abnormality of the processing apparatus based on comparisons of the temperatures of the component at the respective measurement points.
公开/授权文献
- US20210074564A1 METHOD AND SYSTEM FOR INSPECTING PROCESSING APPARATUS 公开/授权日:2021-03-11
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