- 专利标题: Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applications
-
申请号: US16665960申请日: 2019-10-28
-
公开(公告)号: US11823925B2公开(公告)日: 2023-11-21
- 发明人: Mei Sun , Earl Jensen , Jing G Zhou , Ran Liu
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA Corporation
- 当前专利权人: KLA Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Suiter Swantz pc llo
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; H01L21/687
摘要:
An apparatus includes an instrumented substrate apparatus, a substrate assembly including a bottom and top substrate mechanically coupled, an electronic assembly, a nested enclosure assembly including an outer and inner enclosure wherein the outer enclosure encloses the inner enclosure and the inner enclosure encloses the electronic assembly. An insulating medium between the inner and outer enclosure and a sensor assembly communicatively coupled to the electronic assembly including one or more sensors disposed at one or more locations within the substrate assembly wherein the electronic assembly is configured to receive one or more measurement parameters from the one or more sensors.
信息查询
IPC分类: