Invention Grant
- Patent Title: Bipolar junction transistors including a portion of a base layer inside a cavity in a dielectric layer
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Application No.: US17574785Application Date: 2022-01-13
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Publication No.: US11848374B2Publication Date: 2023-12-19
- Inventor: Shesh Mani Pandey , Jagar Singh , Judson Holt
- Applicant: GlobalFoundries U.S. Inc.
- Applicant Address: US NY Malta
- Assignee: GlobalFoundries U.S. Inc.
- Current Assignee: GlobalFoundries U.S. Inc.
- Current Assignee Address: US NY Malta
- Agency: Thompson Hine LLP
- Agent Francois Pagette
- Main IPC: H01L29/737
- IPC: H01L29/737 ; H01L29/66 ; H01L21/762 ; H01L29/06

Abstract:
Structures for a bipolar junction transistor and methods of forming a structure for a bipolar junction transistor. The structure includes a dielectric layer having a cavity, a first semiconductor layer on the dielectric layer, a collector including a portion on the first semiconductor layer, an emitter including a portion on the first semiconductor layer, and a second semiconductor layer that includes a first section in the cavity and a second section. The second section of the second semiconductor layer is laterally positioned between the portion of the collector and the portion of the emitter.
Public/Granted literature
- US20230084007A1 BIPOLAR JUNCTION TRANSISTORS INCLUDING A PORTION OF A BASE LAYER INSIDE A CAVITY IN A DIELECTRIC LAYER Public/Granted day:2023-03-16
Information query
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