Invention Grant
- Patent Title: Sequential infiltration synthesis apparatus and a method of forming a patterned structure
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Application No.: US16952363Application Date: 2020-11-19
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Publication No.: US11851755B2Publication Date: 2023-12-26
- Inventor: Jan Willem Maes , Werner Knaepen , Krzysztof Kamil Kachel , David Kurt de Roest , Bert Jongbloed , Dieter Pierreux
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- The original application number of the division: US15380921 2016.12.15
- Main IPC: C23C16/04
- IPC: C23C16/04 ; C23C16/455 ; C23C16/44 ; H01L21/033 ; C23C16/448 ; C23C16/26 ; C23C16/52 ; C23C16/56

Abstract:
A sequential infiltration synthesis apparatus comprising:
a reaction chamber constructed and arranged to hold at least a first substrate;
a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and,
a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by:
activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber;
activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and,
activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber. The program in the memory is programmed with the first period T1 longer than the second period T2.
a reaction chamber constructed and arranged to hold at least a first substrate;
a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and,
a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by:
activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber;
activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and,
activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber. The program in the memory is programmed with the first period T1 longer than the second period T2.
Public/Granted literature
- US20210071298A1 SEQUENTIAL INFILTRATION SYNTHESIS APPARATUS AND A METHOD OF FORMING A PATTERNED STRUCTURE Public/Granted day:2021-03-11
Information query
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