Invention Grant
- Patent Title: Semiconductor device with a passivation layer and method for producing thereof
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Application No.: US17481459Application Date: 2021-09-22
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Publication No.: US11854926B2Publication Date: 2023-12-26
- Inventor: Jens Peter Konrath , Christian Hecht , Roland Rupp , Andre Kabakow
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L23/31
- IPC: H01L23/31 ; H01L29/739 ; H01L29/78 ; H01L29/808 ; H01L29/861 ; H01L29/06 ; H01L29/10 ; H01L21/02 ; H01L21/28 ; H01L21/283 ; H01L21/308 ; H01L21/56 ; H01L23/29 ; H01L27/06 ; H01L29/47 ; H01L29/66 ; H01L29/70 ; H01L29/872 ; H01L29/423

Abstract:
A semiconductor device includes a semiconductor body comprising a first surface and an edge surface, a contact electrode formed on the first surface and comprising an outer edge side, and a passivation layer section conformally covering the outer edge side of the contact electrode. The passivation layer section is a multi-layer stack comprising a first layer, a second layer, and a third layer. Each of the first, second and third layers include outer edge sides facing the edge surface and opposite facing inner edge sides. The outer edge side of the contact electrode is disposed laterally between the inner edge sides and the outer edge sides of each layer.
Public/Granted literature
- US20220005742A1 Semiconductor Device with a Passivation Layer and Method for Producing Thereof Public/Granted day:2022-01-06
Information query
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