Invention Grant
- Patent Title: Variable resistance memory device and method of manufacturing the same
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Application No.: US17204599Application Date: 2021-03-17
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Publication No.: US11856872B2Publication Date: 2023-12-26
- Inventor: Jaeho Jung , Kwangmin Park , Jonguk Kim , Dongsung Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR 20200084795 2020.07.09
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H10N70/00 ; H10B63/00

Abstract:
A variable resistance memory device includes first conductive lines extending in a first direction, second conductive lines extending in a second direction and crossing the first conductive lines in a plan view, and cell structures respectively provided at crossing points of the first conductive lines and the second conductive lines in the plan view. Each of the cell structures includes a switching pattern, a variable resistance pattern, and a first electrode provided between the switching pattern and the first conductive line, the first electrode including carbon. Each of the first conductive lines includes an upper pattern including a metal nitride in an upper portion thereof. The upper pattern is in contact with a bottom surface of the first electrode.
Public/Granted literature
- US20220013722A1 VARIABLE RESISTANCE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-01-13
Information query
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