Invention Grant
- Patent Title: Distributed LC filter structure
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Application No.: US17130715Application Date: 2020-12-22
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Publication No.: US11862834B2Publication Date: 2024-01-02
- Inventor: Frédéric Voiron , Mohamed Mehdi Jatlaoui
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Nagaokakyo
- Agency: ArentFox Schiff LLP
- Priority: EP 305846 2017.06.30
- Main IPC: H01L23/66
- IPC: H01L23/66 ; H01P1/20 ; H02M1/44 ; H01L27/01

Abstract:
A distributed LC filter structure is disclosed. The distributed LC filter structure provides simultaneously a distributed inductance and a distributed capacitance in the same structure. Accordingly, discrete passive elements are eliminated and high, homogenous integration is achieved. Interconnections between the distributed inductance and the distributed capacitance are tailored to leverage a parasitic inductance of the distributed capacitance to increase the overall inductance of the distributed LC filter structure. Similarly, the interconnections are tailored to leverage a parasitic capacitance resulting from the distributed inductance to add up with the distributed capacitance augmenting the overall capacitance of the structure.
Public/Granted literature
- US20210111468A1 DISTRIBUTED LC FILTER STRUCTURE Public/Granted day:2021-04-15
Information query
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