Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17504316Application Date: 2021-10-18
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Publication No.: US11876032B2Publication Date: 2024-01-16
- Inventor: Shinnosuke Takahashi , Masayuki Aoike , Masatoshi Hase , Fumio Harima
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto-fu
- Agency: Studebaker & Brackett PC
- Priority: JP 20176595 2020.10.21
- Main IPC: H01L23/373
- IPC: H01L23/373 ; H01L25/065 ; H01L25/18 ; H01L23/00 ; H01L25/00 ; H01L29/737

Abstract:
A bond layer including at least one metal region in a plan view is disposed on a surface layer portion of a substrate formed from a semiconductor. A semiconductor element is disposed on the bond layer and includes a first transistor disposed on a first metal region that is a metal region as the at least one metal region of the bond layer and including a collector layer electrically coupled to the first metal region, a base layer disposed on the collector layer, and an emitter layer disposed on the base layer. A first emitter electrode is disposed on the emitter layer of the first transistor. A first conductor protrusion is disposed on the first emitter electrode. The thermal conductivity of the semiconductor material of the surface layer portion is higher than that of each of the collector layer, the base layer, and the emitter layer of the first transistor.
Public/Granted literature
- US20220122901A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-04-21
Information query
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