Invention Grant
- Patent Title: Common substrate and shadow ring lift apparatus
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Application No.: US17232078Application Date: 2021-04-15
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Publication No.: US11881375B2Publication Date: 2024-01-23
- Inventor: Abhishek Chowdhury , Nataraj Bhaskar Rao , Siqing Lu , Ravikumar Patil
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: MOSER TABOADA
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/32 ; H01J37/24 ; H01J37/248

Abstract:
Embodiments of a lift apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a lift apparatus includes: a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly; a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly; an actuator; and a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.
Public/Granted literature
- US20220336182A1 COMMON SUBSTRATE AND SHADOW RING LIFT APPARATUS Public/Granted day:2022-10-20
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