- 专利标题: Method for manufacturing electronic chips
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申请号: US18153929申请日: 2023-01-12
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公开(公告)号: US11881413B2公开(公告)日: 2024-01-23
- 发明人: Michael De Cruz , Olivier Ory
- 申请人: STMICROELECTRONICS (TOURS) SAS
- 申请人地址: FR Tours
- 专利权人: STMICROELECTRONICS (TOURS) SAS
- 当前专利权人: STMICROELECTRONICS (TOURS) SAS
- 当前专利权人地址: FR Tours
- 代理机构: Seed IP Law Group LLP
- 优先权: FR 13744 2019.12.04
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763 ; H01L21/48 ; H01L21/56
摘要:
A method for manufacturing electronic chips includes forming, on the side of a first face of a semiconductor substrate, in and on which a plurality of integrated circuits has been formed beforehand, metallizations coupling contacts of adjacent integrated circuits to one another. The method further includes forming, on the side of the first face of the substrate, first trenches extending through the first face of the substrate and laterally separating the adjacent integrated circuits. The first trenches extend through the metallizations to form at least a portion of metallizations at each of the adjacent circuits.
公开/授权文献
- US20230178380A1 METHOD FOR MANUFACTURING ELECTRONIC CHIPS 公开/授权日:2023-06-08
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