Invention Grant
- Patent Title: Transient voltage suppression device and manufacturing method therefor
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Application No.: US17267835Application Date: 2019-08-15
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Publication No.: US11887979B2Publication Date: 2024-01-30
- Inventor: Shikang Cheng , Yan Gu , Sen Zhang
- Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Applicant Address: CN Wuxi
- Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee Address: CN Wuxi
- Agency: Dority & Manning, PA
- Priority: CN 1811012572.6 2018.08.31
- International Application: PCT/CN2019/100717 2019.08.15
- International Announcement: WO2020/042915A 2020.03.05
- Date entered country: 2021-02-11
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/66 ; H01L29/866

Abstract:
A transient voltage suppression device and a manufacturing method therefor, the transient voltage suppression device including: a substrate, a first conductivity type well region and a second conductivity type well region disposed in the substrate. The first conductivity type well region includes a first well, a second well, and a third well. The second conductivity type well region includes a fourth well that isolates the first well from the second well, and a fifth well that isolates the second well from the third well. The device further includes a Zener diode well region provided in the first well, a first doped region provided in the Zener diode well region, a second doped region provided in the Zener diode well region, a third doped region provided in the second well, a fourth doped region provided in the third well, and a fifth doped region provided in the third well.
Public/Granted literature
- US20210249403A1 Transient Voltage Suppression Device and Manufacturing Method Therefor Public/Granted day:2021-08-12
Information query
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