A semiconductor memory device including a substrate having a first region and a second region; a plurality of first transistors provided in the first region; a plurality of second transistors provided in the second region, the plurality of second transistors being electrically coupled to the plurality of first transistors, respectively, and a breakdown-voltage of the second transistor being lower than a breakdown-voltage of the first transistor. A plurality of joint metals are provided above the first region, the plurality of joint metals being electrically coupled to the plurality of first transistors, respectively. A plurality of bit lines are provided in an upper layer of the plurality of joint metals, the plurality of bit lines being coupled to the plurality of joint metals, respectively; and a plurality of memory cells are provided in an upper layer of the plurality of bit lines, the plurality of memory cells being coupled to the plurality of bit lines, respectively.