Invention Grant
- Patent Title: Photocurable resin composition and 3D stereolithography product using same
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Application No.: US17428910Application Date: 2020-02-14
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Publication No.: US11891462B2Publication Date: 2024-02-06
- Inventor: Koji Watanabe , Hiroaki Ozoe
- Applicant: NAGASE CHEMTEX CORPORATION
- Applicant Address: JP Osaka
- Assignee: Nagase Chemtex Corporation
- Current Assignee: Nagase Chemtex Corporation
- Current Assignee Address: JP Osaka
- Agency: Stinson LLP
- Priority: JP 19027834 2019.02.19
- International Application: PCT/JP2020/005904 2020.02.14
- International Announcement: WO2020/170990A 2020.08.27
- Date entered country: 2021-08-05
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08G61/04 ; B33Y10/00 ; B33Y70/00 ; B29C64/129 ; C08F222/10 ; C08F220/30 ; C08F220/20 ; C08F224/00 ; C08K3/36 ; C08K5/5397 ; C08K9/04 ; B29K33/00

Abstract:
A photocurable resin composition includes a reactive monomer, a reactive oligomer, and a photopolymerization initiator. A cured product of the reactive monomer has a glass transition point of less than 20° C., and a cured product of the reactive oligomer has a glass transition point of less than 20° C. A cured product of the photocurable resin composition has a loss tangent tan δ at 25° C. of 0.2 or less. The cured product of the photocurable resin composition has an elongation at break in accordance with ASTM D638 of 150% or more.
Public/Granted literature
- US20220127386A1 PHOTOCURABLE RESIN COMPOSITION AND 3D STEREOLITHOGRAPHY PRODUCT USING SAME Public/Granted day:2022-04-28
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