Invention Grant
- Patent Title: Array substrate, method for preparing array substrate, and backlight module
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Application No.: US17281015Application Date: 2020-01-03
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Publication No.: US11894394B2Publication Date: 2024-02-06
- Inventor: Zhanfeng Cao , Yingwei Liu , Ke Wang , Guocai Zhang , Jianguo Wang , Zhiwei Liang , Haixu Li , Muxin Di
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: ArentFox Schiff LLP
- Agent Michael Fainberg
- International Application: PCT/CN2020/070325 2020.01.03
- International Announcement: WO2021/134794A 2021.07.08
- Date entered country: 2021-03-29
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L27/15 ; C25D7/12 ; C25D17/00

Abstract:
An array substrate, a method for preparing the array substrate, and a backlight module are disclosed. Before electroplating a first metal layer on a pattern of a seed layer, the method further includes: forming a pattern of a compensation electrode wire electrically connected with a lead electrode on a side, where the lead electrode is formed, of a base substrate. The compensation electrode wire is at least on a second side of a wiring region, the pattern of the lead electrode is formed at a first side of the wiring region, and the first side and the second side are different sides. In the electroplating process, the lead electrode is connected with a negative pole of a power supply, the compensation electrode wire is electrically connected with the lead electrode, thus an area of an electroplating negative pole generating electric field lines is increased by utilizing the compensation electrode wire.
Public/Granted literature
- US20220123024A1 ARRAY SUBSTRATE, METHOD FOR PREPARING ARRAY SUBSTRATE, AND BACKLIGHT MODULE Public/Granted day:2022-04-21
Information query
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