Invention Grant
- Patent Title: Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
-
Application No.: US17824977Application Date: 2022-05-26
-
Publication No.: US11901161B2Publication Date: 2024-02-13
- Inventor: Tae Seung Cho , Saravana Kumar Natarajan , Kenneth D. Schatz , Dmitry Lubomirsky , Samartha Subramanya
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: MOSER TABOADA
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46

Abstract:
Methods and apparatus for reducing particle generation in a remote plasma source (RPS) include an RPS having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the RPS provides radicals or ions into the processing volume, and a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode.
Public/Granted literature
Information query