- 专利标题: Laser reflow apparatus and laser reflow method
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申请号: US17123318申请日: 2020-12-16
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公开(公告)号: US11935863B2公开(公告)日: 2024-03-19
- 发明人: Satoshi Kobayashi , Youngsuk Kim , Nobuyuki Kimura , Yuki Ikku , Zhiwen Chen
- 申请人: DISCO CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: DISCO CORPORATION
- 当前专利权人: DISCO CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: GREER BURNS & CRAIN, LTD.
- 优先权: JP 19234128 2019.12.25
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; B23K1/00 ; B23K1/005 ; B23K3/08 ; B23K26/03 ; B23K26/06 ; B23K101/40 ; G02B19/00 ; G02B27/30
摘要:
A laser reflow apparatus reflows solder bumps disposed on a side of a semiconductor chip in a workpiece and included in an irradiation range on the workpiece by applying a laser beam to an opposite side of the semiconductor chip. The laser reflow apparatus includes a spatial beam modulation unit including a laser power density setting function to locally set the laser power density in the irradiation range of a laser beam emitted from a laser beam source, and an image focusing unit including an image focusing function to focus the laser beam emitted from the laser beam source and apply the focused laser beam to the irradiation range on the workpiece.
公开/授权文献
- US20210202431A1 LASER REFLOW APPARATUS AND LASER REFLOW METHOD 公开/授权日:2021-07-01
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