- 专利标题: TOF mass calibration
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申请号: US17310989申请日: 2020-06-10
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公开(公告)号: US11948788B2公开(公告)日: 2024-04-02
- 发明人: Robert E. Haufler , William M. Loyd , Takashi Baba
- 申请人: DH TECHNOLOGIES DEVELOPMENT PTE. LTD.
- 申请人地址: SG Singapore
- 专利权人: DH Technologies Development Pte. Ltd.
- 当前专利权人: DH Technologies Development Pte. Ltd.
- 当前专利权人地址: SG Singapore
- 代理机构: Kasha Law LLC
- 代理商 John R. Kasha; Kelly L. Kasha
- 国际申请: PCT/IB2020/055464 2020.06.10
- 国际公布: WO2020/250157A 2020.12.17
- 进入国家日期: 2021-09-03
- 主分类号: H01J49/40
- IPC分类号: H01J49/40 ; H01J49/00
摘要:
A calibration apparatus for a mass analyzer includes an ion source device and a dual-purpose electron beam generating unit. The ion source device ionizes an analyte of a sample, producing analyte ions. The dual-purpose electron beam generating unit is positioned between the ion source device and the mass analyzer. In a first mode, the dual-purpose electron beam generating unit is used to create fragments of analyte ions of unknown mass-to-charge ratio. In a second mode, the dual-purpose electron beam generating unit is used to create ions of calibration compounds of known mass-to-charge ratio. All ions are subsequently transferred to the mass analyzer.
公开/授权文献
- US20220093383A1 TOF Mass Calibration 公开/授权日:2022-03-24
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