- 专利标题: Patterned wavelength-selective image
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申请号: US17262042申请日: 2019-07-23
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公开(公告)号: US11953706B2公开(公告)日: 2024-04-09
- 发明人: Kui Chen-Ho , Kenneth L. Smith , Douglas S. Dunn , Tien Yi T. H. Whiting , John A. Wheatley , Bryan T. Whiting , Taylor J. Kobe , Anthony F. Schultz , Duane D. Fansler , Jonah Shaver
- 申请人: 3M INNOVATIVE PROPERTIES COMPANY
- 申请人地址: US MN St. Paul
- 专利权人: 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人: 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人地址: US MN St. Paul
- 国际申请: PCT/IB2019/056301 2019.07.23
- 国际公布: WO2020/021458A 2020.01.30
- 进入国家日期: 2021-01-21
- 主分类号: G02B5/20
- IPC分类号: G02B5/20 ; G02B5/08 ; G02B5/12 ; G02B5/22 ; G09F3/00 ; G09F3/02
摘要:
Wavelength-selective films are visibly apparent under the selective wavelength. Wavelength-selective films typically reflect off axis the selected wavelength and therefore can provide high-contrast against a background when applied in a pattern on a substrate. However, it is difficult to apply unique patterned embedded images from film. Disclosed is a cost-effective method and construction of a patterned wavelength-selective image to a substrate. In the disclosed wavelength-selective image, wavelength-selective film particles are applied to an adhesive pattern to create the wavelength-selective image.
公开/授权文献
- US20210286111A1 A PATTERNED WAVELENGTH-SELECTIVE IMAGE 公开/授权日:2021-09-16
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