Invention Grant
- Patent Title: Patterned wavelength-selective image
-
Application No.: US17262042Application Date: 2019-07-23
-
Publication No.: US11953706B2Publication Date: 2024-04-09
- Inventor: Kui Chen-Ho , Kenneth L. Smith , Douglas S. Dunn , Tien Yi T. H. Whiting , John A. Wheatley , Bryan T. Whiting , Taylor J. Kobe , Anthony F. Schultz , Duane D. Fansler , Jonah Shaver
- Applicant: 3M INNOVATIVE PROPERTIES COMPANY
- Applicant Address: US MN St. Paul
- Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee Address: US MN St. Paul
- International Application: PCT/IB2019/056301 2019.07.23
- International Announcement: WO2020/021458A 2020.01.30
- Date entered country: 2021-01-21
- Main IPC: G02B5/20
- IPC: G02B5/20 ; G02B5/08 ; G02B5/12 ; G02B5/22 ; G09F3/00 ; G09F3/02

Abstract:
Wavelength-selective films are visibly apparent under the selective wavelength. Wavelength-selective films typically reflect off axis the selected wavelength and therefore can provide high-contrast against a background when applied in a pattern on a substrate. However, it is difficult to apply unique patterned embedded images from film. Disclosed is a cost-effective method and construction of a patterned wavelength-selective image to a substrate. In the disclosed wavelength-selective image, wavelength-selective film particles are applied to an adhesive pattern to create the wavelength-selective image.
Public/Granted literature
- US20210286111A1 A PATTERNED WAVELENGTH-SELECTIVE IMAGE Public/Granted day:2021-09-16
Information query