- 专利标题: Nitride semiconductor substrate, laminate, substrate selection program, substrate data output program, off-angle coordinate map, and methods thereof
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申请号: US16759004申请日: 2018-08-08
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公开(公告)号: US11967617B2公开(公告)日: 2024-04-23
- 发明人: Fumimasa Horikiri , Takehiro Yoshida
- 申请人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址: JP Tokyo
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Foley & Lardner LLP
- 优先权: JP 17208139 2017.10.27
- 国际申请: PCT/JP2018/029720 2018.08.08
- 国际公布: WO2019/082472A 2019.05.02
- 进入国家日期: 2020-08-27
- 主分类号: C30B29/38
- IPC分类号: C30B29/38 ; C23C16/34 ; C30B25/18 ; C30B29/40 ; H01L21/02 ; H01L29/20
摘要:
A nitride semiconductor substrate including a group III nitride semiconductor crystal and having a main surface, wherein a low index crystal plane is (0001) plane curved in a concave spherical shape to the main surface, and the off-angle (θm, θa) at a position (x, y) in the main surface approximated by x representing a coordinate in a direction along axis, y is a coordinate in a direction along axis, (0, 0) represents a coordinate (x, y) of the center, θm represents a direction component along axis in an off-angle of axis with respect to a normal, θa represents a direction component along axis in the off-angle, (M1, A1) represents a rate of change in the off-angle (θm, θa) with respect to the position (x, y) in the main surface, and (M2, A2) represents the off-angle (θm, θa) at the center.
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