Invention Grant
- Patent Title: Nitride semiconductor substrate, laminate, substrate selection program, substrate data output program, off-angle coordinate map, and methods thereof
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Application No.: US16759004Application Date: 2018-08-08
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Publication No.: US11967617B2Publication Date: 2024-04-23
- Inventor: Fumimasa Horikiri , Takehiro Yoshida
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 17208139 2017.10.27
- International Application: PCT/JP2018/029720 2018.08.08
- International Announcement: WO2019/082472A 2019.05.02
- Date entered country: 2020-08-27
- Main IPC: C30B29/38
- IPC: C30B29/38 ; C23C16/34 ; C30B25/18 ; C30B29/40 ; H01L21/02 ; H01L29/20

Abstract:
A nitride semiconductor substrate including a group III nitride semiconductor crystal and having a main surface, wherein a low index crystal plane is (0001) plane curved in a concave spherical shape to the main surface, and the off-angle (θm, θa) at a position (x, y) in the main surface approximated by x representing a coordinate in a direction along axis, y is a coordinate in a direction along axis, (0, 0) represents a coordinate (x, y) of the center, θm represents a direction component along axis in an off-angle of axis with respect to a normal, θa represents a direction component along axis in the off-angle, (M1, A1) represents a rate of change in the off-angle (θm, θa) with respect to the position (x, y) in the main surface, and (M2, A2) represents the off-angle (θm, θa) at the center.
Information query
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