- 专利标题: Optical etendue matching methods for extreme ultraviolet metrology
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申请号: US16862279申请日: 2020-04-29
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公开(公告)号: US11968772B2公开(公告)日: 2024-04-23
- 发明人: Zefram Marks , Larissa Juschkin , Daniel C. Wack
- 申请人: KLA Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA Corporation
- 当前专利权人: KLA Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Suiter Swantz IP
- 主分类号: H05H13/04
- IPC分类号: H05H13/04 ; G01N21/88 ; G02B26/08 ; G02F1/11 ; H05H7/04 ; H05H7/00
摘要:
An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.
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