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1.发明公开公开(公告)号：US20240243143A1
公开(公告)日：2024-07-18
申请号：US18391595
申请日：2023-12-20
Applicant: KLA Corporation
Inventor： Evgeniia Butaeva , Sisir Yalamanchili , Larissa Juschkin , John Fielden , Ting Fung Chung , Francisco Kole
IPC: H01L27/146 , G01N21/95
CPC classification number: H01L27/1462 , G01N21/9501 , H01L27/14636 , H01L27/1464 , H01L27/14685 , G02B1/11
Abstract: Back-illuminated image sensors for detecting short wavelength radiation (e.g., deep ultraviolet (DUV) and vacuum ultraviolet (VUV) light) include a semiconductor membrane, circuit elements formed on a frontside surface of the semiconductor membrane, and a pure boron coating on the backside surface of the semiconductor membrane. A two-part anti-reflective coating is formed over the pure boron coating and includes a thin oxide or nitride protection layer disposed between the pure boron coating and a fluoride-based anti-reflection layer. A method for fabricating the image sensors may include performing plasma atomic layer deposition (plasma ALD) processes to sequentially generate the pure boron coating, the oxide/nitride protection layer and then the fluoride-based anti-reflection layer. The image sensors may be configured as charge coupled devices (CCDs), complementary metal oxide semiconductor (CMOS) sensors, or as photodiodes, and arranged as two-dimensional (2D) area sensors or a one-dimensional (1D) array sensors.
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公开(公告)号：US20210262944A1
公开(公告)日：2021-08-26
申请号：US17110856
申请日：2020-12-03
Applicant: KLA Corporation
Inventor： Larissa Juschkin , Konstantin Tsigutkin , Debashis De Munshi
Abstract: An inspection system and a method of using the same are disclosed. The inspection system comprises an illumination source configured to emit an extreme ultraviolet (EUV) illumination beam for illuminating a sample, one or more first multi-cell detectors configured to generate a first illumination intensity distribution signal based on a first photocurrent, one or more second multi-cell detectors configured to generate a second illumination intensity distribution signal based on a second photocurrent, a detector assembly configured to receive the illumination beam and generate images, and a controller configured to: receive the images from the detector assembly, calibrate the second illumination intensity distribution signal to the images by mapping distortions in the second illumination intensity distribution signal to distorted pixels in the images, increase or decrease intensities of the distorted pixels in the images to generate corrected images, and detect defects on the samples.
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Patent Agency Ranking
公开(公告)号：US11968772B2
公开(公告)日：2024-04-23
申请号：US16862279
申请日：2020-04-29
Applicant: KLA Corporation
Inventor： Zefram Marks , Larissa Juschkin , Daniel C. Wack
CPC classification number: H05H13/04 , G01N21/8806 , G02B26/085 , G02F1/11 , H05H7/04 , G01N2021/8887 , H05H2007/002 , H05H2007/005
Abstract: An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.
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公开(公告)号：US20200383200A1
公开(公告)日：2020-12-03
申请号：US16862279
申请日：2020-04-29
Applicant: KLA Corporation
Inventor： Zefram Marks , Larissa Juschkin , Daniel C. Wack
Abstract: An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.
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公开(公告)号：US11499924B2
公开(公告)日：2022-11-15
申请号：US16885211
申请日：2020-05-27
Applicant: KLA Corporation
Inventor： Larissa Juschkin , Konstantin Tsigutkin
Abstract: Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.
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公开(公告)号：US11293880B2
公开(公告)日：2022-04-05
申请号：US17110856
申请日：2020-12-03
Applicant: KLA Corporation
Inventor： Larissa Juschkin , Konstantin Tsigutkin , Debashis De Munshi
Abstract: An inspection system and a method of using the same are disclosed. The inspection system comprises an illumination source configured to emit an extreme ultraviolet (EUV) illumination beam for illuminating a sample, one or more first multi-cell detectors configured to generate a first illumination intensity distribution signal based on a first photocurrent, one or more second multi-cell detectors configured to generate a second illumination intensity distribution signal based on a second photocurrent, a detector assembly configured to receive the illumination beam and generate images, and a controller configured to: receive the images from the detector assembly, calibrate the second illumination intensity distribution signal to the images by mapping distortions in the second illumination intensity distribution signal to distorted pixels in the images, increase or decrease intensities of the distorted pixels in the images to generate corrected images, and detect defects on the samples.
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公开(公告)号：US20200378901A1
公开(公告)日：2020-12-03
申请号：US16885211
申请日：2020-05-27
Applicant: KLA Corporation
Inventor： Larissa Juschkin , Konstantin Tsigutkin
Abstract: Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.
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