- 专利标题: Photonic waveguide and method of forming the same
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申请号: US17717128申请日: 2022-04-11
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公开(公告)号: US11994717B2公开(公告)日: 2024-05-28
- 发明人: Ming Yang Chung , Chewn-Pu Jou , Stefan Rusu , Cheng-Tse Tang
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: WPAT LAW
- 代理商 Anthony King
- 主分类号: G02B6/293
- IPC分类号: G02B6/293 ; G02B6/124 ; G02B6/132 ; G02B6/12
摘要:
A method includes: determining a first material and a second material of a photonic waveguide for propagating light, the photonic waveguide having a first section and a second section arranged in a first layer and a second layer, respectively, of the photonic waveguide; determining a spacing between the first layer and the second layer; determining a parameter set of a crosstalk reduction structure, according to the spacing, the first material and a wavelength of the light, to cause insertion losses of the first section and the second section to be lower than a predetermined threshold; and forming the first and second sections with the first and second materials, respectively, the first section having the crosstalk reduction structure overlapping the second section.
公开/授权文献
- US20230324609A1 PHOTONIC WAVEGUIDE AND METHOD OF FORMING THE SAME 公开/授权日:2023-10-12
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