- 专利标题： Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner
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申请号： US18203853申请日： 2023-05-31
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公开(公告)号： US12000041B2公开(公告)日： 2024-06-04
- 发明人: Patrick Tae
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Lowenstein Sandler LLP
- 分案原申请号： US16946264 2020.06.12
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; C23C16/44 ; C23C16/455 ; G01N21/55 ; H01L21/67
摘要：
A method includes receiving light, by a light coupling device and along an optical path, reflected back from a reflector mounted on a liner of a processing chamber. The method further includes detecting, by a spectrometer within the received light, a first spectrum representative of a deposited film layer on the reflector. The method further includes aligning, using an alignment device, the light coupling device in two dimensions with reference to the reflector along the optical path until maximization of the light received by the light coupling device.
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