Invention Grant
- Patent Title: Patterned wavelength-selective film
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Application No.: US17261983Application Date: 2019-07-23
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Publication No.: US12001038B2Publication Date: 2024-06-04
- Inventor: Kui Chen-Ho , Douglas S. Dunn , Tien Yi T. H. Whiting , Bryan T. Whiting , Taylor J. Kobe , Anthony F. Schultz , Duane D. Fansler , Jonah Shaver , John A. Wheatley , Susannah C. Clear , Daniel J. Theis , John T. Strand , Thomas J. Metzler , Kevin W. Gotrik , Scott J. Jones
- Applicant: 3M INNOVATIVE PROPERTIES COMPANY
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- International Application: PCT/IB2019/056302 2019.07.23
- International Announcement: WO2020/021459A 2020.01.30
- Date entered country: 2021-01-21
- Main IPC: G02B5/26
- IPC: G02B5/26 ; G02B5/124 ; G02B5/20

Abstract:
The disclosed patterned wavelength-selective material and process for making the patterned wavelength-selective material uses patterned applied adhesive and a structurally weak wavelength-selective material that includes portions that contact the adhesive and break to remain in contact with the adhesive. In one embodiment, the wavelength-selective material comprises an array of sections with cuts at least partially through a wavelength-selective film at each section secured to the adhesive. In another embodiment, the wavelength-selective film comprises a transfer stack of layers.
Public/Granted literature
- US20220113457A1 A PATTERNED WAVELENGTH-SELECTIVE FILM Public/Granted day:2022-04-14
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