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1.发明授权公开(公告)号：US08968629B2
公开(公告)日：2015-03-03
申请号：US14270838
申请日：2014-05-06
发明人： John S. Huizinga , John T. Strand , James N. Dobbs , Thomas B. Hunter , William V. Dower , Daniel H. Carlson , Serge Wetzels , Gregory F. King , Olester Benson, Jr. , Jeremy K. Larsen , Michael Benton Free , David W. Kuhns
IPC分类号： B29C59/04 , B29C59/16 , B29C35/08 , B29C39/14 , B29C39/20 , G03F7/095 , G03F7/20 , H05K3/00 , H05K3/10 , B05D1/40 , B05D3/06 , B05D3/12 , B29C43/46 , B29C59/02 , H05K1/03
CPC分类号： B29C59/04 , B05D1/40 , B05D3/067 , B05D3/12 , B05D2252/02 , B29C35/0805 , B29C35/0888 , B29C35/0894 , B29C39/148 , B29C39/203 , B29C59/046 , B29C2035/0827 , B29C2043/463 , B29C2059/023 , G03F7/0957 , G03F7/2032 , H05K1/0393 , H05K3/0008 , H05K3/0079 , H05K3/101 , H05K2201/0108 , H05K2203/0113 , H05K2203/0143 , H05K2203/1545 , H05K2203/1572
摘要： An apparatus for casting a patterned surface on both sides of an opaque web. The apparatus includes a first patterned roll, a second pattered roll, and a means for rotating the first and second patterned rolls such that their patterns are transferred to opposite sides of the opaque web while it is in continuous motion. During this process, their patterns are maintained in continuous registration to within at least 100 micrometers.
摘要翻译： 用于在不透明网的两侧上铸造图案化表面的装置。 该设备包括第一图案化辊，第二图案辊和用于旋转第一和第二图案化辊的装置，使得它们的图案在连续运动时转移到不透明纸幅的相对侧。 在该过程中，它们的图案被保持在至少100微米内的连续配准。
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公开(公告)号：US10537028B2
公开(公告)日：2020-01-14
申请号：US15320016
申请日：2015-06-26
发明人： Matthew S. Stay , Matthew R. Smith , Mikhail L. Pekurovsky , John T. Strand , Moses M. David , Glen A. Jerry , Ellison G. Kawakami , Karl K. Stensvad , James R. Starkey
摘要： Electrically conductive patterns formed on a substrate are provided with a reduced visibility. A region of a major surface of the substrate is selectively roughened to form a roughened pattern on the major surface of the substrate. Electrically conductive traces are directly formed on the roughened region and are conformal with the roughened pattern on the major surface of the substrate.
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公开(公告)号：US20170142841A1
公开(公告)日：2017-05-18
申请号：US15320016
申请日：2015-06-26
发明人： Matthew S. Stay , Matthew R. Smith , Mikhail L. Pekurovsky , John T. Strand , Moses M. David , Glen A. Jerry , Ellison G. Kawakami , Karl K. Stensvad , James R. Starkey
摘要： Electrically conductive patterns formed on a substrate are provided with a reduced visibility. A region of a major surface of the substrate is selectively roughened to form a roughened pattern on the major surface of the substrate. Electrically conductive traces are directly formed on the roughened region and are conformal with the roughened pattern on the major surface of the substrate.
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公开(公告)号：US12001038B2
公开(公告)日：2024-06-04
申请号：US17261983
申请日：2019-07-23
发明人： Kui Chen-Ho , Douglas S. Dunn , Tien Yi T. H. Whiting , Bryan T. Whiting , Taylor J. Kobe , Anthony F. Schultz , Duane D. Fansler , Jonah Shaver , John A. Wheatley , Susannah C. Clear , Daniel J. Theis , John T. Strand , Thomas J. Metzler , Kevin W. Gotrik , Scott J. Jones
摘要： The disclosed patterned wavelength-selective material and process for making the patterned wavelength-selective material uses patterned applied adhesive and a structurally weak wavelength-selective material that includes portions that contact the adhesive and break to remain in contact with the adhesive. In one embodiment, the wavelength-selective material comprises an array of sections with cuts at least partially through a wavelength-selective film at each section secured to the adhesive. In another embodiment, the wavelength-selective film comprises a transfer stack of layers.
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5.发明授权公开(公告)号：US10167546B2
公开(公告)日：2019-01-01
申请号：US15558384
申请日：2016-04-25
发明人： John T. Strand , David B. Olson
IPC分类号： C23C14/34 , G03F7/00 , B05D1/28 , B05D3/00 , B05D3/06 , C23C14/02 , C23C14/58 , B29C41/00 , C08J5/18 , C08J7/12 , C08F220/28 , C09D4/00 , G03F7/027 , H01L21/027 , B29L9/00
摘要： Compositions of matter capable of being cast and cured to form a microreplicated pattern on a substrate, and further capable of swelling on exposure to water so as to release from that substrate. Water swellable acrylic polymers formed from these compositions, and methods of using same in nanoimprint lithography are also disclosed.
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6.发明申请公开(公告)号：US20180080119A1
公开(公告)日：2018-03-22
申请号：US15558384
申请日：2016-04-25
发明人： John T. Strand , David B. Olson
IPC分类号： C23C14/34 , G03F7/00 , B05D1/28 , B05D3/06 , B05D3/00 , C23C14/58 , C23C14/02 , B29C41/00 , C08J7/12 , C08J5/18 , C08F220/28
CPC分类号： C23C14/34 , B05D1/28 , B05D3/007 , B05D3/067 , B29C41/003 , B29L2009/008 , C08F220/28 , C08F2220/286 , C08J5/18 , C08J7/12 , C08J2333/14 , C09D4/00 , C23C14/021 , C23C14/58 , G03F7/0002 , G03F7/027 , H01L21/0272 , C08F2220/585 , C08F2222/1093
摘要： Compositions of matter capable of being cast and cured to form a microreplicated pattern on a substrate, and further capable of swelling on exposure to water so as to release from that substrate. Water swellable acrylic polymers formed from these compositions, and methods of using same in nanoimprint lithography are also disclosed.
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