Invention Grant
- Patent Title: Nozzle apparatus and apparatus for treating substrate
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Application No.: US17225892Application Date: 2021-04-08
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Publication No.: US12017234B2Publication Date: 2024-06-25
- Inventor: Min Jung Park
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-Do
- Agency: Procopio, Cory, Hargreaves & Savitch LLP
- Priority: KR 20200042877 2020.04.08
- Main IPC: B05B1/04
- IPC: B05B1/04 ; B05B3/02 ; B05C5/02

Abstract:
A nozzle apparatus may comprise a nozzle body having a nozzle tip with a discharge port for spraying a treatment fluid onto a substrate; a nozzle moving member for moving the nozzle body relative to the substrate; a rotating member for rotating the nozzle body or the nozzle tip so that a treatment fluid is sprayed onto the substrate during rotation; and a control unit configured to control an operation of the nozzle moving member and the rotating member.
Public/Granted literature
- US20210316319A1 NOZZLE APPARATUS AND APPARATUS FOR TREATING SUBSTRATE Public/Granted day:2021-10-14
Information query
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