Invention Grant
- Patent Title: Adaptive wear leveling for endurance compensation
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Application No.: US17858731Application Date: 2022-07-06
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Publication No.: US12026042B2Publication Date: 2024-07-02
- Inventor: Charles See Yeung Kwong , Seungjune Jeon , Wei Wang , Zhenming Zhou
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Lowenstein Sandler LLP
- Main IPC: G06F11/00
- IPC: G06F11/00 ; G06F11/07

Abstract:
A set of blocks of a memory device comprising a plurality of dies is identified. A block within the set of blocks is identified. The identified block is associated with a capability metric that reflects a projected reliability of the die on which the block resides. Responsive to determining that the capability metric satisfies a condition, a cycle threshold associated with the die is identified. Responsive to determining that a cycle count value derived from a program/erase cycle counter associated with the die matches the cycle threshold, the set of blocks is updated by excluding the block from the set of blocks. A program operation is performed with respect to the updated set of blocks.
Public/Granted literature
- US20230393920A1 ADAPTIVE WEAR LEVELING FOR ENDURANCE COMPENSATION Public/Granted day:2023-12-07
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