- 专利标题: Field effect transistor including channel formed of 2D material
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申请号: US18056446申请日: 2022-11-17
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公开(公告)号: US12027588B2公开(公告)日: 2024-07-02
- 发明人: Minhyun Lee , Minsu Seol , Yeonchoo Cho , Hyeonjin Shin
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR 20200033310 2020.03.18
- 主分类号: H01L29/10
- IPC分类号: H01L29/10 ; H01L29/24 ; H01L29/423
摘要:
A field effect transistor includes a substrate, a source electrode and a drain electrode on the substrate and apart from each other in a first direction, a plurality of channel layers, a gate insulating film surrounding each of the plurality of channel layers, and a gate electrode surrounding the gate insulating film. Each of the plurality of channel layers has ends contacting the source electrode and the drain electrode. The plurality of channel layers are spaced apart from each other in a second direction away from the substrate. The plurality of channel layers include a 2D semiconductor material.
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