Invention Grant
- Patent Title: Resonance apparatus for processing electrical loss using conductive material and method for manufacturing the same
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Application No.: US17245545Application Date: 2021-04-30
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Publication No.: US12028048B2Publication Date: 2024-07-02
- Inventor: Hosoo Park , Duck Hwan Kim , Chul Soo Kim , Sang Uk Son , In Sang Song , Jeashik Shin , Moonchul Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR 20120100437 2012.09.11
- Main IPC: H03H9/54
- IPC: H03H9/54 ; H03H9/02 ; H03H9/13 ; H03H9/17 ; H10N30/06 ; H10N30/87
Abstract:
A resonance apparatus that processes an electrical loss using a conductive material and a method of manufacturing the resonance apparatus are provided. The resonance apparatus includes a lower electrode formed at a predetermined distance from a substrate, and a piezoelectric layer formed on the lower electrode. The resonance apparatus further includes an upper electrode formed on the piezoelectric layer, and a conductive layer formed on the upper electrode or the lower electrode.
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