Invention Grant
- Patent Title: Advanced-packaging high-volume-mode digital-lithography-tool
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Application No.: US17872546Application Date: 2022-07-25
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Publication No.: US12032284B2Publication Date: 2024-07-09
- Inventor: Shih-Hao Kuo , Hsiu-Jen Wang , Ulrich Mueller , Jang Fung Chen
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20

Abstract:
Exemplary methods of packaging a substrate may include rotationally aligning a substrate to a predetermined angular position. The methods may include transferring the substrate to a metrology station. The methods may include measuring a topology of the substrate at the metrology station. The methods may include applying a first chucking force to the substrate to flatten the substrate. The methods may include generating a mapping of a die pattern on an exposed surface of the substrate. The methods may include transferring the substrate to a printing station. The methods may include applying a second chucking force to the substrate to flatten the substrate against a surface of the printing station. The methods may include adjusting a printing pattern based on the mapping of the die pattern. The methods may include printing the printing pattern on the exposed surface of the substrate.
Public/Granted literature
- US20240027896A1 ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL Public/Granted day:2024-01-25
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