Invention Grant
- Patent Title: Plasma processing apparatus and wear amount measurement method
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Application No.: US17196089Application Date: 2021-03-09
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Publication No.: US12033838B2Publication Date: 2024-07-09
- Inventor: Joji Takayoshi , Ryuta Akimoto , Takehito Watanabe
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer; Tanya E. Harkins
- Priority: JP 20052708 2020.03.24 JP 20189617 2020.11.13
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J37/244 ; H01L21/67

Abstract:
A plasma processing apparatus including a processing container and a conductive member, includes a plasma generator configured to generate plasma in the processing container, a power application part configured to apply a DC power to the conductive member in a state in which plasma is generated in the processing container by the plasma generator, a measurement part configured to measure a physical quantity related to the DC power applied by the power application part, and a calculator configured to obtain a wear amount of the conductive member using the measured physical quantity related to the DC power in a correlation function between the wear amount of the conductive member and the physical quantity related to the DC power.
Public/Granted literature
- US20210305027A1 PLASMA PROCESSING APPARATUS AND WEAR AMOUNT MEASUREMENT METHOD Public/Granted day:2021-09-30
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