Invention Grant
- Patent Title: Device manufacturing methods
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Application No.: US17941378Application Date: 2022-09-09
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Publication No.: US12078935B2Publication Date: 2024-09-03
- Inventor: Rizvi Rahman , Hakki Ergün Cekli , Cédric Désiré Grouwstra
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury IA/inthrop Shaw Pittman, LLP
- Priority: EP 175967 2017.06.14
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G05B19/418 ; H01L21/66

Abstract:
A device manufacturing method, the method comprising: obtaining a measurement data time series of a plurality of substrates on which an exposure step and a process step have been performed; obtaining a status data time series relating to conditions prevailing when the process step was performed on at least some of the plurality of substrates; applying a filter to the measurement data time series and the status data time series to obtain filtered data; and determining, using the filtered data, a correction to be applied in an exposure step performed on a subsequent substrate.
Public/Granted literature
- US20230004095A1 DEVICE MANUFACTURING METHODS Public/Granted day:2023-01-05
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