- 专利标题: Ferroelectric devices and ferroelectric memory cells
-
申请号: US17812132申请日: 2022-07-12
-
公开(公告)号: US12080329B2公开(公告)日: 2024-09-03
- 发明人: Albert Liao , Wayne I. Kinney , Yi Fang Lee , Manzar Siddik
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: TraskBritt
- 主分类号: G11C11/22
- IPC分类号: G11C11/22 ; H01L49/02 ; H10B53/30 ; H10B53/40
摘要:
A semiconductor structure includes an electrode, a ferroelectric material adjacent the electrode, the ferroelectric material comprising an oxide of at least one of hafnium and zirconium, the ferroelectric material doped with bismuth, and another electrode adjacent the ferroelectric material on an opposite side thereof from the first electrode. Related semiconductor structures, memory cells, semiconductor devices, electronic systems, and related methods are disclosed.
公开/授权文献
- US20220351768A1 FERROELECTRIC DEVICES AND FERROELECTRIC MEMORY CELLS 公开/授权日:2022-11-03
信息查询