- 专利标题： Wafer placement table and method of manufacturing the same
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申请号： US17643600申请日： 2021-12-10
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公开(公告)号： US12087613B2公开(公告)日： 2024-09-10
- 发明人: Hiroshi Takebayashi , Kenichiro Aikawa , Tatsuya Kuno
- 申请人： NGK INSULATORS, LTD.
- 申请人地址： JP Nagoya
- 专利权人： NGK INSULATORS, LTD.
- 当前专利权人： NGK INSULATORS, LTD.
- 当前专利权人地址： JP Nagoya
- 代理机构： BURR PATENT LAW, PLLC
- 优先权： JP 19121487 2019.06.28
- 主分类号： B23Q3/15
- IPC分类号： B23Q3/15 ; C23C4/02 ; C23C4/134 ; H01L21/687
摘要：
A wafer placement table is a ceramic sintered body with a surface provided with multiple projections that support a wafer. Of the surface of the ceramic sintered body, the area provided with no projection is a mirror surface which has a surface roughness Ra of 0.1 μm or less. The projections are formed of an aerosol deposition film or a thermal spray film made of the same material as for the ceramic sintered body.
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