Invention Grant
- Patent Title: Resonators
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Application No.: US17450592Application Date: 2021-10-12
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Publication No.: US12087994B2Publication Date: 2024-09-10
- Inventor: Antoine Pacco , Massimo Mongillo , Anton Potocnik , Danny Wan , Jeroen Verjauw
- Applicant: IMEC vzw , Katholieke Universiteit Leuven
- Applicant Address: BE Leuven
- Assignee: IMEC vzw,Katholieke Universiteit Leuven
- Current Assignee: IMEC vzw,Katholieke Universiteit Leuven
- Current Assignee Address: BE Leuven; BE Leuven
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: EP 201465 2020.10.13
- Main IPC: H01P7/00
- IPC: H01P7/00 ; H01P11/00

Abstract:
A method for forming a modified resonator is provided. In one aspect, the method includes obtaining a resonator on top of a substrate, thereby forming an interface area between a bottom surface of the resonator and a top surface of the substrate. The resonator can include niobium or tantalum. The method also includes contacting the resonator and the substrate with a liquid acidic etching solution selected so as to have a higher etch rate towards the substrate than towards the resonator and a nonzero etch rate towards the resonator.
Public/Granted literature
- US20220115759A1 RESONATORS Public/Granted day:2022-04-14
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