Invention Grant
- Patent Title: Semiconductor MPS diode with reduced current-crowding effect and manufacturing method thereof
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Application No.: US17818926Application Date: 2022-08-10
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Publication No.: US12094985B2Publication Date: 2024-09-17
- Inventor: Simone Rascuna′ , Mario Giuseppe Saggio
- Applicant: STMICROELECTRONICS S.R.L.
- Applicant Address: IT Agrate Brianza
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group LLP
- Priority: IT 2019000004195 2019.03.22
- The original application number of the division: US16825214 2020.03.20
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L29/06 ; H01L29/20 ; H01L29/45 ; H01L29/47 ; H01L29/66 ; H01L29/872

Abstract:
A merged-PN-Schottky, MPS, diode includes an N substrate, an N-drift layer, a P-doped region in the drift layer, an ohmic contact on the P-doped region, a plurality of cells within the P-doped region and being portions of the drift layer where the P-doped region is absent, an anode metallization on the ohmic contact and on said cells, to form junction-barrier contacts and Schottky contacts respectively. The P-doped region has a grid-shaped layout separating from one another each cell and defining, together with the cells, an active area of the MPS diode. Each cell has a same geometry among quadrangular, quadrangular with rounded corners and circular; and the ohmic contact extends at the doped region with continuity along the grid-shaped layout.
Public/Granted literature
- US20220384662A1 SEMICONDUCTOR MPS DIODE WITH REDUCED CURRENT-CROWDING EFFECT AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-12-01
Information query
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