Invention Grant
- Patent Title: Polyimide-based transistor devices and methods of fabricating the same
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Application No.: US17337707Application Date: 2021-06-03
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Publication No.: US12096641B2Publication Date: 2024-09-17
- Inventor: Jianguo Mei , Aristide Gumyusenge
- Applicant: Purdue Research Foundation
- Applicant Address: US IN West Lafayette
- Assignee: Purdue Research Foundation
- Current Assignee: Purdue Research Foundation
- Current Assignee Address: US IN West Lafayette
- Agency: Hartman Global IP Law
- Agent Gary M. Hartman; Domenica N.S. Hartman
- Main IPC: H01L51/05
- IPC: H01L51/05 ; C08G73/10 ; C08L79/08 ; H10K10/46 ; H10K85/10

Abstract:
A transistor device that includes a substrate comprising metallic gate contacts, a dielectric layer on the substrate comprising a polyimide or derivative thereof, a semiconductor layer on the dielectric layer comprising a semiconducting polymer confined in a host matrix material comprising a polyimide or derivative thereof, and source and drain contacts on the semiconductor layer.
Public/Granted literature
- US20220223808A1 POLYIMIDE-BASED TRANSISTOR DEVICES AND METHODS OF FABRICATING THE SAME Public/Granted day:2022-07-14
Information query
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