- 专利标题: Surface charge and power feedback and control using a switch mode bias system
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申请号: US16871613申请日: 2020-05-11
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公开(公告)号: US12125674B2公开(公告)日: 2024-10-22
- 发明人: Daniel Carter
- 申请人: Advanced Energy Industries, Inc.
- 申请人地址: US CO Fort Collins
- 专利权人: Advanced Energy Industries, Inc.
- 当前专利权人: Advanced Energy Industries, Inc.
- 当前专利权人地址: US CO Denver
- 代理机构: Neugeboren O'Dowd PC
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; H03K3/64 ; H03K3/70 ; H03K3/78
摘要:
Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis, and to maintain surface charge buildup below a threshold.
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