Invention Grant
- Patent Title: Piezo-resistive transistor based resonator with anti-ferroelectric gate dielectric
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Application No.: US18130334Application Date: 2023-04-03
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Publication No.: US12125893B2Publication Date: 2024-10-22
- Inventor: Tanay Gosavi , Chia-Ching Lin , Raseong Kim , Ashish Verma Penumatcha , Uygar Avci , Ian Young
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Essential Patents Group, LLP
- The original application number of the division: US16238419 2019.01.02
- Main IPC: H01L29/51
- IPC: H01L29/51 ; H01L27/088 ; H01L29/423 ; H01L29/78 ; H03H9/17

Abstract:
Describe is a resonator that uses anti-ferroelectric (AFE) materials in the gate of a transistor as a dielectric. The use of AFE increases the strain/stress generated in the gate of the FinFET. Along with the usual capacitive drive, which is boosted with the increased polarization, additional current drive is also achieved from the piezoelectric response generated to due to AFE material. In some embodiments, the acoustic mode of the resonator is isolated using phononic gratings all around the resonator using the metal line above and vias' to body and dummy fins on the side. As such, a Bragg reflector is formed above or below the AFE based transistor. Increased drive signal from the AFE results in larger output signal and larger bandwidth.
Public/Granted literature
- US20230253475A1 PIEZO-RESISTIVE TRANSISTOR BASED RESONATOR WITH ANTI-FERROELECTRIC GATE DIELECTRIC Public/Granted day:2023-08-10
Information query
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