Invention Grant
- Patent Title: Electro-absorption modulated laser with integrated filter layer
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Application No.: US17405416Application Date: 2021-08-18
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Publication No.: US12136796B2Publication Date: 2024-11-05
- Inventor: Dapeng Xu , Jin Huang , Huanlin Zhang
- Applicant: Applied Optoelectronics, Inc.
- Applicant Address: US TX Sugar Land
- Assignee: Applied Optoelectronics, Inc.
- Current Assignee: Applied Optoelectronics, Inc.
- Current Assignee Address: US TX Sugar Land
- Agency: Grossman Tucker Perreault & Pfleger, PLLC
- Main IPC: H01S3/10
- IPC: H01S3/10 ; H01S5/026 ; H01S5/065 ; H01S5/12 ; H01S5/20 ; H01S5/22 ; H01S5/343 ; H01S5/028

Abstract:
The present disclosure is generally directed to an EML with a filter layer disposed between an active region of the EML and a substrate of the EML to absorb a portion of unmodulated light energy, and preferably the unmodulated light energy caused by transverse electric (TE) substrate mode. The filter layer preferably comprises a material with an energy band gap (Eg) that is less than the energy band gap of the predetermined channel wavelength to absorb unmodulated laser light.
Public/Granted literature
- US20230053516A1 ELECTRO-ABSORPTION MODULATED LASER WITH INTEGRATED FILTER LAYER Public/Granted day:2023-02-23
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