Invention Grant
- Patent Title: System for inspecting and grounding a mask in a charged particle system
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Application No.: US17778579Application Date: 2020-10-21
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Publication No.: US12142451B2Publication Date: 2024-11-12
- Inventor: Tianming Chen , Chiyan Kuan , Yixiang Wang , Zhi Po Wang
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- International Application: PCT/EP2020/079674 WO 20201021
- International Announcement: WO2021/083773 WO 20210506
- Main IPC: H01J37/02
- IPC: H01J37/02 ; G03F7/00 ; H01J37/28

Abstract:
A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.
Public/Granted literature
- US20230005698A1 SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SYSTEM Public/Granted day:2023-01-05
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