公开(公告)号：US10775325B2

公开(公告)日：2020-09-15

申请号：US16147277

申请日：2018-09-28

Applicant: ASML Netherlands B.V.

Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: G01N23/2251 ,  H05F3/02 ,  H01J37/20 ,  H01J37/02 ,  H01J37/28

Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

公开(公告)号：US12142451B2

公开(公告)日：2024-11-12

申请号：US17778579

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Tianming Chen ,  Chiyan Kuan ,  Yixiang Wang ,  Zhi Po Wang

IPC: H01J37/02 ,  G03F7/00 ,  H01J37/28

Abstract: A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

公开(公告)号：US11448607B2

公开(公告)日：2022-09-20

申请号：US16470928

申请日：2017-12-04

Applicant: ASML Netherlands B.V.

Inventor： Chiyan Kuan

IPC: G01N23/225 ,  H01J37/22 ,  H01J37/30 ,  H01J37/153 ,  H01J37/21

Abstract: Systems and methods are provided for dynamically compensating position errors of a sample. The system can comprise one or more sensing units configured to generate a signal based on a position of a sample and a controller. The controller can be configured to determine the position of the sample based on the signal and in response to the determined position, provide information associated with the determined position for control of one of a first handling unit in a first chamber, a second handling unit in a second chamber, and a beam location unit in the second chamber.