Invention Grant
- Patent Title: Symmetric plasma source to generate pie-shaped treatment
-
Application No.: US17137296Application Date: 2020-12-29
-
Publication No.: US12142458B2Publication Date: 2024-11-12
- Inventor: Anantha K. Subramani , Farzad Houshmand , Philip A. Kraus , Abhishek Chowdhury , John C. Forster , Kallol Bera
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/455 ; C23C16/50 ; H01L21/67 ; H05H1/24 ; H01L21/3065 ; H01L21/311 ; H01L21/3213
Abstract:
Plasma source assemblies comprising a housing with an RF hot electrode having a body and a plurality of source electrodes extending vertically from the RF hot electrode toward the opening in a front face of the housing are described. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.
Public/Granted literature
- US20210210312A1 Symmetric Plasma Source to Generate Pie-Shaped Treatment Public/Granted day:2021-07-08
Information query
