Invention Grant
- Patent Title: Particle removal device and method
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Application No.: US17856651Application Date: 2022-07-01
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Publication No.: US12158701B2Publication Date: 2024-12-03
- Inventor: Cheng-Hsuan Wu , Ming-Hsun Tsai , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: NZ CARR LAW OFFICE
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
A particle removal device, along with methods of using such, are described. The device includes a handheld module having a body. A first one or more channels and a second one or more channels are formed in the body. The body includes a nozzle, and the handheld module is configured to provide suction by the nozzle and to inject an ionized fluid stream by the nozzle. The body further includes a handle attached to the nozzle.
Public/Granted literature
- US20220334496A1 PARTICLE REMOVAL DEVICE AND METHOD Public/Granted day:2022-10-20
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