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公开(公告)号：US12096543B2
公开(公告)日：2024-09-17
申请号：US18151930
申请日：2023-01-09
发明人： Chiao-Hua Cheng , Hsin-Feng Chen , Yu-Fa Lo , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/7055 , H05G2/008
摘要： A method for using an extreme ultraviolet radiation source is provided. The method includes performing a lithography process using an extreme ultraviolet (EUV) radiation source; after the lithography processes, inserting an extraction tube into a vessel of the EUV radiation source; and cleaning a collector of the EUV radiation source by using the extraction tube.
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公开(公告)号：US11576250B1
公开(公告)日：2023-02-07
申请号：US17445430
申请日：2021-08-19
发明人： Cheng-Hao Lai , Ming-Hsun Tsai , Hsin-Feng Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
摘要： Some implementations described herein provide techniques and apparatuses for an extreme ultraviolet (EUV) radiation source that includes a backsplash-prevention system to reduce, minimize, and/or prevent the formation of tin (Sn) build-up in a tunnel structure of a collector flow ring that might otherwise be caused by the accumulation of Sn satellites. This reduces backsplash of Sn onto a collector of the EUV radiation source, increases the operational life of the collector (e.g., by increasing the time duration between cleaning and/or replacement of the collector), reduces downtime of the EUV radiation source, and/or enables the performance of the EUV radiation source to be sustained for longer time durations (e.g., by reducing, minimizing, and/or preventing the rate of Sn contamination of the collector), among other examples.
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公开(公告)号：US11537053B2
公开(公告)日：2022-12-27
申请号：US17450100
申请日：2021-10-06
发明人： Chiao-Hua Cheng , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Yu-Fa Lo , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
摘要： Some implementations herein include a detection circuit and a fast and accurate in-line method for detecting blockage on a droplet generator head of an extreme ultraviolet exposure tool without impacting the flow of droplets of a target material through the droplet generator head. In some implementations described herein, the detection circuit includes a switch circuit that is configured in an open configuration, in which the switch is electrically open between two electrode elements. When an accumulation of the target material occurs across two or more electrode elements on the droplet generator head, the accumulation functions as a switch that closes the detection circuit. A controller may detect closure of the detection circuit.
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公开(公告)号：US12066761B2
公开(公告)日：2024-08-20
申请号：US17461491
申请日：2021-08-30
发明人： Chiao-Hua Cheng , Sheng-Kang Yu , Shang-Chieh Chien , Wei-Chun Yen , Heng-Hsin Liu , Ming-Hsun Tsai , Yu-Fa Lo , Li-Jui Chen , Wei-Shin Cheng , Cheng-Hsuan Wu , Cheng-Hao Lai , Yu-Kuang Sun , Yu-Huan Chen
IPC分类号： G03F7/00
CPC分类号： G03F7/70483 , G03F7/70033 , G03F7/7085
摘要： In a method of inspecting an extreme ultraviolet (EUV) radiation source, during an idle mode, a borescope mounted on a fixture is inserted through a first opening into a chamber of the EUV radiation source. The borescope includes a connection cable attached at a first end to a camera. The fixture includes an extendible section mounted from a first side on a lead screw, and the camera of the borescope is mounted on a second side, opposite to the first side, of the extendible section. The extendible section is extended to move the camera inside the chamber of the EUV radiation source. One or more images are acquired by the camera from inside the chamber of the EUV radiation source at one or more viewing positions. The one or more acquired images are analyzed to determine an amount of tin debris deposited inside the chamber of the EUV radiation source.
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公开(公告)号：US11533799B1
公开(公告)日：2022-12-20
申请号：US17372294
申请日：2021-07-09
发明人： Hsin-Feng Chen , Ming-Hsun Tsai , Li-Jui Chen , Shang-Chieh Chien , Heng-Hsin Liu , Cheng-Hao Lai , Yu-Huan Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Yu-Fa Lo , Chiao-Hua Cheng
摘要： A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.
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公开(公告)号：US20220100100A1
公开(公告)日：2022-03-31
申请号：US17239952
申请日：2021-04-26
IPC分类号： G03F7/20
摘要： A particle removal device, along with methods of using such, are described. The device includes a handheld module having a body. A first one or more channels and a second one or more channels are formed in the body. The body includes a nozzle, and the handheld module is configured to provide suction by the nozzle and to inject an ionized fluid stream by the nozzle. The body further includes a handle attached to the nozzle.
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公开(公告)号：US12055864B2
公开(公告)日：2024-08-06
申请号：US17694368
申请日：2022-03-14
发明人： Yu-Huan Chen , Cheng-Hsuan Wu , Ming-Hsun Tsai , Shang-Chieh Chien , Li-Jui Chen
CPC分类号： G03F7/70858 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A photolithographic apparatus includes a droplet generator, a droplet generator maintenance system, and a controller communicating with the droplet generator maintenance system. The droplet generator maintenance system operatively communicates with the droplet generator, a coolant distribution unit, a gas supply unit, and a supporting member. The gas supply unit includes a heat exchange assembly and an air heating assembly. The coolant distribution unit is configured to control the temperature of the droplet generator within the acceptable droplet generator range.
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公开(公告)号：US11653438B2
公开(公告)日：2023-05-16
申请号：US17351225
申请日：2021-06-18
发明人： Yu-Fa Lo , Ming-Hsun Tsai , Shang-Chieh Chien
IPC分类号： H05G2/00
摘要： An EUV light source module includes an EUV vessel, a collector disposed in the EUV vessel, a droplet generator, a droplet catcher, and a droplet collecting system. The droplet generator is coupled to the EUV vessel and configured to provide a plurality of target droplets into the EUV vessel. The droplet catcher is coupled to the EUV vessel and configured to catch at least a target droplet from the EUV vessel. The droplet colleting system is coupled to the droplet catcher. The droplet collecting system includes a connecting port coupled to the droplet catcher, and a thermal insulating device surrounding the droplet catcher. The droplet generator and the droplet catcher are disposed at opposite locations in the EUV vessel.
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公开(公告)号：US11644759B2
公开(公告)日：2023-05-09
申请号：US17340874
申请日：2021-06-07
发明人： Yen-Hsun Chen , Ming-Hsun Tsai , Shao-Hua Wang , Han-Lung Chang , Li-Jui Chen , Chia-Chen Chen
CPC分类号： G03F7/70925 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.
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公开(公告)号：US11602037B1
公开(公告)日：2023-03-07
申请号：US17460108
申请日：2021-08-27
IPC分类号： H05G2/00
摘要： A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.
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