Invention Grant
- Patent Title: Methods and assemblies for gas flow ratio control
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Application No.: US18406034Application Date: 2024-01-05
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Publication No.: US12183606B2Publication Date: 2024-12-31
- Inventor: Kevin Brashear , Ashley M. Okada , Dennis L. Demars , Zhiyuan Ye , Jaidev Rajaram , Marcel E. Josephson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; G05D11/13 ; H01L21/67

Abstract:
A master controller identifies a flow ratio setpoint for at least one of a process gas or a carrier gas flow to a process chamber through a set of mass flow controllers. The master controller determines a flow setpoint for the at least one of the process gas or the carrier gas through the set of mass flow controllers based on the identified flow ratio setpoint. The master controller controls the at least one of the process gas flow or the carrier gas flow through each of the set of mass flow controllers according to the determined flow setpoint for each of the set of mass flow controllers and based on a back pressure reading provided by a back pressure sensor.
Public/Granted literature
- US20240145275A1 METHODS AND ASSEMBLIES FOR GAS FLOW RATIO CONTROL Public/Granted day:2024-05-02
Information query
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