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公开(公告)号：US20230017206A1
公开(公告)日：2023-01-19
申请号：US17935810
申请日：2022-09-27
Applicant: Applied Materials, Inc.
Inventor： Kevin Brashear , Ashley M. Okada , Dennis L. Demars , Zhiyuan Ye , Jaidev Rajaram , Marcel E. Josephson
Abstract: A master controller determines a first flow setpoint for a process flow gas and/or a carrier gas flow through a first mass flow controller. The master controller obtains a back pressure setpoint of a distribution manifold and determines a second flow setpoint for the process gas flow and/or the carrier gas flow through a second mass flow controller or a back pressure controller based on the determined first flow setpoint and the obtained back pressure setpoint. The master controller controls the process gas flow and/or the carrier gas flow through the first mass flow controller to the first flow setpoint and the second mass flow controller and/or the back pressure controller to the second flow setpoint. The master controller controls the back pressure of the distribution manifold to the back pressure set point in view of a back pressure reading from a back pressure sensor of the distribution manifold.
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公开(公告)号：US20190332129A1
公开(公告)日：2019-10-31
申请号：US16396684
申请日：2019-04-27
Applicant: Applied Materials, Inc.
Inventor： Michael Rice , Joseph AuBuchon , Sanjeev Baluja , Ashley M. Okada , Alexander Fernandez , Ming Xu , Marcel E. Josephson , Sushant Suresh Koshti , Kenneth Le , Kevin M. Brashear
IPC: G05D7/06
Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.
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公开(公告)号：US20190206707A1
公开(公告)日：2019-07-04
申请号：US16293341
申请日：2019-03-05
Applicant: Applied Materials, Inc.
Inventor： Kevin Brashear , Ashley M. Okada , Dennis L. Demars , Zhiyuan Ye , Jaidev Rajaram , Marcel E. Josephson
CPC classification number: H01L21/67253 , G05D11/132 , H01L21/67017
Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.
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公开(公告)号：US11604089B2
公开(公告)日：2023-03-14
申请号：US17247091
申请日：2020-11-30
Applicant: Applied Materials, Inc.
Inventor： Zhiyuan Ye , Justin Hough , Marcel E. Josephson
IPC: G01F25/17 , G01F1/36 , G05D7/06 , G05B23/02 , G01F1/50 , G01F1/38 , G01F25/10 , G01F1/42 , H01L21/67
Abstract: An electronic device manufacturing system includes: a gas supply; a mass flow controller (MFC) coupled to the gas supply; an inlet coupled to the MFC; an outlet; a control volume serially coupled to the inlet to receive a gas flow; and a flow restrictor serially coupled to the control volume and the outlet. A controller is adapted to allow the gas supply to flow gas through the control volume and the flow restrictor to achieve a stable pressure in the control volume, terminate the gas flow from the gas supply, and measure a rate of pressure decay in the control volume over time. A process chamber is coupled to a flow path, which is coupled to the mass flow controller, the process chamber to receive one or more process chemistries via the mass flow controller.
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公开(公告)号：US11519773B2
公开(公告)日：2022-12-06
申请号：US16777467
申请日：2020-01-30
Applicant: Applied Materials, Inc.
Inventor： Kevin M. Brashear , Zhiyuan Ye , Justin Hough , Jaidev Rajaram , Marcel E. Josephson , Ashley M. Okada
Abstract: Mass flow verification systems and apparatus may verify mass flow rates of mass flow controllers (MFCs) based on choked flow principles. These systems and apparatus may include a plurality of differently-sized flow restrictors coupled in parallel. A wide range of flow rates may be verified via selection of a flow path through one of the flow restrictors based on an MFC's set point. Mass flow rates may be determined via pressure and temperature measurements upstream of the flow restrictors under choked flow conditions. Methods of verifying a mass flow rate based on choked flow principles are also provided, as are other aspects.
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Patent Agency Ranking
公开(公告)号：US10684159B2
公开(公告)日：2020-06-16
申请号：US15194360
申请日：2016-06-27
Applicant: Applied Materials, Inc.
Inventor： Kevin M. Brashear , Zhiyuan Ye , Justin Hough , Jaidev Rajaram , Marcel E. Josephson , Ashley M. Okada
Abstract: Mass flow verification systems and apparatus may verify mass flow rates of mass flow controllers (MFCs) based on choked flow principles. These systems and apparatus may include a plurality of differently-sized flow restrictors coupled in parallel. A wide range of flow rates may be verified via selection of a flow path through one of the flow restrictors based on an MFC's set point. Mass flow rates may be determined via pressure and temperature measurements upstream of the flow restrictors under choked flow conditions. Methods of verifying a mass flow rate based on choked flow principles are also provided, as are other aspects.
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公开(公告)号：US20200166400A1
公开(公告)日：2020-05-28
申请号：US16777467
申请日：2020-01-30
Applicant: Applied Materials, Inc.
Inventor： Kevin M. Brashear , Zhiyuan Ye , Justin Hough , Jaidev Rajaram , Marcel E. Josephson , Ashley M. Okada
Abstract: Mass flow verification systems and apparatus may verify mass flow rates of mass flow controllers (MFCs) based on choked flow principles. These systems and apparatus may include a plurality of differently-sized flow restrictors coupled in parallel. A wide range of flow rates may be verified via selection of a flow path through one of the flow restrictors based on an MFC's set point. Mass flow rates may be determined via pressure and temperature measurements upstream of the flow restrictors under choked flow conditions. Methods of verifying a mass flow rate based on choked flow principles are also provided, as are other aspects.
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公开(公告)号：US10453721B2
公开(公告)日：2019-10-22
申请号：US15070342
申请日：2016-03-15
Applicant: Applied Materials, Inc.
Inventor： Kevin Brashear , Ashley M. Okada , Dennis L. Demars , Zhiyuan Ye , Jaidev Rajaram , Marcel E. Josephson
Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.
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公开(公告)号：US12183606B2
公开(公告)日：2024-12-31
申请号：US18406034
申请日：2024-01-05
Applicant: Applied Materials, Inc.
Inventor： Kevin Brashear , Ashley M. Okada , Dennis L. Demars , Zhiyuan Ye , Jaidev Rajaram , Marcel E. Josephson
IPC: C23C16/455 , G05D11/13 , H01L21/67
Abstract: A master controller identifies a flow ratio setpoint for at least one of a process gas or a carrier gas flow to a process chamber through a set of mass flow controllers. The master controller determines a flow setpoint for the at least one of the process gas or the carrier gas through the set of mass flow controllers based on the identified flow ratio setpoint. The master controller controls the at least one of the process gas flow or the carrier gas flow through each of the set of mass flow controllers according to the determined flow setpoint for each of the set of mass flow controllers and based on a back pressure reading provided by a back pressure sensor.
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公开(公告)号：US20240145275A1
公开(公告)日：2024-05-02
申请号：US18406034
申请日：2024-01-05
Applicant: Applied Materials, Inc.
Inventor： Kevin Brashear , Ashley M. Okada , Dennis L. Demars , Zhiyuan Ye , Jaidev Rajaram , Marcel E. Josephson
CPC classification number: H01L21/67253 , G05D11/132 , H01L21/67017
Abstract: A master controller identifies a flow ratio setpoint for at least one of a process gas or a carrier gas flow to a process chamber through a set of mass flow controllers. The master controller determines a flow setpoint for the at least one of the process gas or the carrier gas through the set of mass flow controllers based on the identified flow ratio setpoint. The master controller controls the at least one of the process gas flow or the carrier gas flow through each of the set of mass flow controllers according to the determined flow setpoint for each of the set of mass flow controllers and based on a back pressure reading provided by a back pressure sensor.
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