Invention Grant
- Patent Title: Laser processing device, and method for manufacturing chip
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Application No.: US17763379Application Date: 2020-08-07
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Publication No.: US12233481B2Publication Date: 2025-02-25
- Inventor: Hiroaki Tamemoto , Minoru Yamamoto , Yusuke Sekimoto , Ryota Sugio , Tominori Nakamura
- Applicant: NICHIA CORPORATION , HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Anan; JP Hamamatsu
- Assignee: NICHIA CORPORATION,HAMAMATSU PHOTONICS K.K.
- Current Assignee: NICHIA CORPORATION,HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Anan; JP Hamamatsu
- Agency: Faegre Drinker Biddle Reath LLP
- Priority: JP2019-180676 20190930
- International Application: PCT/JP2020/030465 WO 20200807
- International Announcement: WO2021/065207 WO 20210408
- Main IPC: B23K26/53
- IPC: B23K26/53 ; B23K26/046 ; B23K26/0622 ; B23K101/40 ; H01L21/78

Abstract:
This laser processing apparatus is for forming modified regions in an object, which includes a sapphire substrate having a C-plane as a main surface, along cutting lines by focusing laser light on the object, and is provided with a laser light source, a spatial light modulator, and a focusing optical system. The spatial light modulator performs aberration correction by a first aberration correction amount smaller than an ideal aberration correction amount when the modified region is formed along a first cutting line along an a-axis direction of the sapphire substrate, and performs aberration correction by a second aberration correction amount smaller than the ideal aberration correction amount and different from the first aberration correction amount when the modified region is formed along a second cutting line along an m-axis direction of the sapphire substrate.
Public/Granted literature
- US20220371130A1 LASER PROCESSING DEVICE, AND METHOD FOR MANUFACTURING CHIP Public/Granted day:2022-11-24
Information query
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