Invention Grant
- Patent Title: Defect detection system for cavity in integrated circuit
-
Application No.: US18172488Application Date: 2023-02-22
-
Publication No.: US12292470B2Publication Date: 2025-05-06
- Inventor: Zhuojie Wu , Yunyao Jiang
- Applicant: GlobalFoundries U.S. Inc.
- Applicant Address: US NY Malta
- Assignee: GlobalFoundries U.S. Inc.
- Current Assignee: GlobalFoundries U.S. Inc.
- Current Assignee Address: US NY Malta
- Agency: Hoffman Warnick LLC
- Agent Jessie Cheah
- Main IPC: G01R31/28
- IPC: G01R31/28 ; G02B6/12

Abstract:
A structure provides a defect sensor for a cavity in an integrated circuit (IC). The structure includes a cavity defined in a substrate. A boundary is located where the cavity meets with a cavity-free area of the substrate. A metal line is arranged in a serpentine path in both a vertical and a horizontal direction and crosses the boundary. A controller may be provided that is configured to, in response to a change in an electrical characteristic of a signal through the metal line, generate an indication of the presence of a defect and/or change operation of at least one component of the IC. The structure may find application relative to a photonics integrated circuit (PIC) structure including an optical waveguide with a cavity under the optical waveguide.
Public/Granted literature
- US20240280632A1 DEFECT DETECTION SYSTEM FOR CAVITY IN INTEGRATED CIRCUIT Public/Granted day:2024-08-22
Information query